Taiwan, China – Technic, a world-class leader in semiconductor electrodeposition chemistry, photoresist cleaners, etchants, and strippers as well as analytical controls and equipment, presented its most current product offerings at Semicon Taiwan 2018 at the Taipei Nangang Exhibition Center. The company showcased several new products and technologies for semiconductor manufacturing and packaging.

Cranston, RI, USA – Technic presented a technical paper Customized Chemical Compositions Adaptable for Cleaning Virtually All Post-Etch Residues at the bi-annual UCPSS Symposium in Leuven, Belgium on September 2-5, 2018.

The paper is a collaboration between Technic, STMicroelectronics, and CEA-Leti and was presented by Technic’s Technology and Innovation Director, Dr. Jerome Daviot. The presentation focused on an optimized cleaning solution to meet the challenges of post-etch residue removal of high-k materials such as tantalum, zirconium, and hafnium which are notoriously resilient and difficult to remove.