New, High Performance, Non-hazardous Photoresist Stripper

Technic has announced the release of TechniStrip® Micro D2, a specially developed non-hazardous replacement for N-methylpyrrolidone (NMP) - based photoresist strippers.

With increased concerns and regulations of NMP as a reprotoxin, Technic has developed a new photoresist stripper, free of NMP that achieves higher performance without a substantial increase in cost. TechniStrip® Micro D2 is an environmentally friendly, non-hazardous solution of specially developed organic solvents with running costs similar to NMP-based strippers.

Technic presented a technical paper Customized Chemical Compositions Adaptable for Cleaning Virtually All Post-Etch Residues at the bi-annual UCPSS Symposium in Leuven, Belgium on September 2-5, 2018.

The paper is a collaboration between Technic, STMicroelectronics, and CEA-Leti and was presented by Technic’s Technology and Innovation Director, Dr. Jerome Daviot. The presentation focused on an optimized cleaning solution to meet the challenges of post-etch residue removal of high-k materials such as tantalum, zirconium, and hafnium which are notoriously resilient and difficult to remove.