Strippers, Etchants & Cleaners for Semiconductor Fabrication

Photoresist Strippers, Metal Etchants & Cleaners 
 

In semiconductor fabrication, precision chemical processing is essential for reliable device performance. With decades of expertise in wet processes, Technic is recognized as a trusted leader in providing high-performance chemistries for a variety of substrates used in wafer level surface preparation.

Our portfolio is focused on three core product lines:

• Photoresist strippers (resist removers, lift-off chemistries) – Formulated for the controlled removal of photoresist and other temporary masking layers after lithography. These products ensure complete removal of both liquid and dryfilm resist, while preserving underlying films and device features.
• Metal etchants (material removers, pattern transfer chemistries) – Designed for the selective removal of metals, oxides, and other thin films. Etchants enable accurate pattern definition and surface shaping required for device structures.
• Cleaners (surface preparation solutions, particle/residue removers) – Developed to eliminate particles, organic films, and trace metallic contamination at multiple process steps. Cleaners prepare wafer surfaces by removing contaminants that could interfere with subsequent deposition, etching, or bonding processes.
   

Through continuous R&D, including European-level collaborative projects, Technic is actively developing safer alternatives to traditional wet process chemistries. These innovations help customers reduce the environmental impact of their processes through improved waste management, direct water rinsing, eco-design, and reclaimable chemistries.