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TechniStrip® NI555

Stripper for advanced AZ EM resist.

Characteristics:

Specially formulated to fully dissolve AZ EM advanced line of photoresist: AZ15nXT, AZ40XT, and AZnLOF 2000 series.

Availability: North America, Asia Pacific, Europe
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TechniStrip® NI777

Acidic, NMP and DMSO-free stripper for full dissolution of chemically amplified resins.

Characteristics:
  • Efficient performance with a balanced composition.
  • Excellent compatibility with sensitive device layers.
  • Recommended for stripping of P- & N-tone resists, such as chemically amplified resists (AZ15nXT, nLOF, etc.).
Availability: North America, Asia Pacific, Europe
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TechniStrip® NI789

Acidic, NMP and DMSO-free stripper for the full dissolution of chemically amplified resins.

Characteristics:

More concentrated formulation vs other products in the TechniStrip® product line.
Particularly effective for the stripping of P- & N-tone resists, such as chemically amplified resists (AZ15nXT, nLOF, etc.).

Availability: North America, Asia Pacific, Europe
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