Begin your search by selecting the Application, Process and Category or by specifying keyword(s)

Optional Filters

Process Results (5) Request More Information

TechniStrip® 680

Advanced 100% solvent-based blend for photoresist stripping and lift-off processes.

Characteristics:
  • DMSO-based process.
  • Optimized formulation that offers a safer, more efficient alternative to conventional NMP, pure DMSO, or DMSO/amine strippers.
Availability: North America, Asia Pacific, Europe
Add

TechniStrip® Micro D2

Technic ECO ProductVersatile photoresist stripper formulated to address resin lift-off and dissolution of negative and positive tone resist. TechniStrip Micro D2 is an environmentally friendly alternative for NMP, DMSO and DMSO/Amine based photoresist strippers.

Characteristics:
  • Non-hazardous replacement for NMP.
  • Lower running cost and improved performance over NMP and DMSO-based resist strippers.
Availability: North America, Asia Pacific, Europe
Add

TechniStrip® Micro D350

100% solvent-based blend for photoresist stripping, lift-off processes.

Characteristics:
  • Non-hazardous alternative to pure NMP
  • As efficient as pure NMP.
  • High material compatibility, low metal ion contamination.
Availability: North America, Asia Pacific, Europe
Add

TechniStrip® MLO02

Stripper for positive-tone photoresist stripping, polyimide dissolution, and metal lift-off processes.

Characteristics:
  • Amine-based, low-toxicity stripper.
  • Safer alternative to legacy NMP-based mixtures.
  • Provides fast removal of resists and polyimides, while keeping a low metal ion contamination.
Availability: North America, Asia Pacific, Europe
Add

TechniStrip® MLO07

Stripper for Metal Lift-Off

Characteristics:
  • Highly efficient positive and negative tone photoresist remover.
  • Used for IR, II/V, MEMS, photonic, TSV mask, solder bumping and hard disk stripping applications.
  • Compatible with Cu, Al, Sn/Ag, Alumina, magnetic alloys and organic substrates such as polymide, parylene and others.
  • Very efficient in metal lift off applications too.
Availability: North America, Asia Pacific, Europe
Add

Equipment Results (2) Request More Information

RTA

Analysis of organic & inorganic levels in acid copper plating solution

Characteristics:

The RTA is an automated, on-line, real-time, and in-tank system for monitoring and controlling the levels of chemical constituents of plating baths.

Availability: Asia Pacific
Add

Test Cell

Wafer plating test cell

Characteristics:

Fully operational, tabletop wafer plating cell for process testing and analysis.

Availability: North America, Asia Pacific, Europe
Add
Finish Request