Cleaners

TechniClean CA25 is a semi-aqueous proprietary blend that has been formulated to address post etch residue (PER) removal for all interconnect and technology nodes. Our advanced chemistry offers a unique blend of ingredients that have been proven to be extremely efficient at quickly and selectively removing organo-metal oxides from the following materials: Al, Cu, Ti, TiN, W and Ni.

TechniClean CA25 has been designed to provide an optimum balance of surface wetting, reduced potential, chelating capacity and residue solubility to accomplish complete PER dissolution at a low temperature and short processing time for various electronic features such as lines, vias and pads.